Title : Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer.

Pub. Date : 2018 Nov 27

PMID : 30481961






2 Functional Relationships(s)
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1 To convert the material into a etch resistant hard mask, we study the selective cyclic infiltration of trimethyl-aluminum (TMA)/water into polyphthalaldehyde. Trimethylaluminum ankyrin repeat and KH domain containing 1 Homo sapiens
2 To convert the material into a etch resistant hard mask, we study the selective cyclic infiltration of trimethyl-aluminum (TMA)/water into polyphthalaldehyde. polyphthalaldehyde ankyrin repeat and KH domain containing 1 Homo sapiens