PMID-sentid	Pub_year	Sent_text		comp_official_name	comp_offsetprotein_name	organism	prot_offset
24302862-2	2013	At film thickness below half of the interlamellar spacing of the diblock copolymer (6.2 nm), the entire silicon is covered by a polymer brush with PEO blocks anchored on the Si substrate due to the substrate-induced effect.	Silicon	104-111	twinkle mtDNA helicase	Homo sapiens	147-150	
24302862-2	2013	At film thickness below half of the interlamellar spacing of the diblock copolymer (6.2 nm), the entire silicon is covered by a polymer brush with PEO blocks anchored on the Si substrate due to the substrate-induced effect.	Silicon	174-176	twinkle mtDNA helicase	Homo sapiens	147-150	
15158392-0	2004	Stability of silicon and titanium carbide suspensions in electrolyte, poly(ethylene oxide), and PEO-surfactant solutions.	Silicon	13-20	twinkle mtDNA helicase	Homo sapiens	96-99