Title : Three-dimensional etching of silicon for the fabrication of low-dimensional and suspended devices.

Pub. Date : 2013 Feb 7

PMID : 23292113






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1 This top-down, CMOS compatible etching scheme allows us to fabricate silicon devices with quantum behavior without relying on difficult lateral lithography. Silicon MOS proto-oncogene, serine/threonine kinase Homo sapiens