Title : Graphene as an atomically thin barrier to Cu diffusion into Si.

Pub. Date : 2014 Jul 7

PMID : 24883431






2 Functional Relationships(s)
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1 The time-dependent dielectric breakdown (TDDB) test is used to evaluate graphene as a Cu diffusion barrier under real device operating conditions, revealing that both large-grain SLG and MLG have excellent barrier performance, while small-grain SLG fails quickly. Graphite sialic acid binding Ig like lectin 12 Homo sapiens
2 Notably, the large-grain SLG acts as a better diffusion barrier than the thicker MLG in the TDDB test, indicating that the grain boundary density of a graphene diffusion barrier is more important than its thickness. Graphite sialic acid binding Ig like lectin 12 Homo sapiens